Silicon Austria Labs GmbH (SAL)
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Oxford Instruments' PlasmaPro®100 PECVD (Plasma Enhanced Chemical Vapour Deposition) is a versatile instrument that can deposit silicon oxide, silicon nitride, Silicon carbide, amorphous silicon, and other films.
PECVD deposition of Silicon-based thin films on wafers up to 8“.
Methods & Expertise for Research Infrastructure
Allocation to Core Facility