Kurzbeschreibung
Die Cluster-Sputteranlage dient zur Abscheidung von funktionalen Dünnschichten unter hochreinen Bedingungen. Die Apparatur besteht aus einer Schleusenkammer, einer Kammer zur Abscheidung von Metallschichten bzw. von transparenten leitenden Oxidschichten, einer Kammer zur Abscheidung von Sulfid-Schichten und einer Prozesssteuereinheit.
Ansprechperson
Prof. Dr. Oliver Diwald
Research Services
Herstellung dünner Schichten mittels Sputterprozessen
Methoden & Expertise zur Forschungsinfrastruktur
Mit der Cluster-Sputteranlage werden reine und zusammengesetzte Nanostrukturen aus Metallen und Halbleitermaterialien erzeugt. In Form von dünnen Schichten werden diese Strukturen für photokatalytische und photovoltaische Anwendungsbereiche entwickelt. Ein weiteres Augenmerk ist das Design und die mit dieser Methode durchgeführte Herstellung von Absorbermaterialien für Licht.
Zuordnung zur Forschungsinfrastruktur
Bitte um Kontaktaufnahme mit der Universität Salzburg (science_plus@plus.ac.at) oder mit der/dem FI-Verantwortlichen.
Fachbereich Geographie und Geologie, Universität Salzburg
Chemmetall
Chemmetall
Sulfosalze in der Energiewandlung
2007-2016
Dittrich, H.
Christian-Doppler Gesellschaft
Nature, reactivity and functionality of hydrogen-derived electron centers in semiconducting oxides
2015 - 2019
Thomas Berger
FWF
https://www.uni-salzburg.at/index.php?id=204780&L=1
Field-Enhanced Photocatalysis at Nanoscale Gaps
2020-2024
Bourret, G.
FWF
https://sites.google.com/view/gillesbourret-nanomaterials/research
Optimizing Catalyst Loading Within Nanostructured Silicon Photoelectrodes
2020-2023
Bourret, G.; Farhadi, A.
ÖAW
Charge separation within graded metal oxide nanocomposites
2023-2026
Diwald, O.; Bourret, G.
FWF
ERC Starting Grant SOLIDCON
2023 - 2028
Christian Prehal
European Research Council
2007-2016
Dittrich, H.
Christian-Doppler Gesellschaft
Nature, reactivity and functionality of hydrogen-derived electron centers in semiconducting oxides
2015 - 2019
Thomas Berger
FWF
https://www.uni-salzburg.at/index.php?id=204780&L=1
Field-Enhanced Photocatalysis at Nanoscale Gaps
2020-2024
Bourret, G.
FWF
https://sites.google.com/view/gillesbourret-nanomaterials/research
Optimizing Catalyst Loading Within Nanostructured Silicon Photoelectrodes
2020-2023
Bourret, G.; Farhadi, A.
ÖAW
Charge separation within graded metal oxide nanocomposites
2023-2026
Diwald, O.; Bourret, G.
FWF
ERC Starting Grant SOLIDCON
2023 - 2028
Christian Prehal
European Research Council
Cupromakopavonite, Cu8Ag3Pb4Bi19S38, A new mineral species, ist crystal structure and the cupropavonite homologous series
2012
Topa, D.; Makovicky, E.; Llinca, G.; Dittrich, H.
CANADIAN MINERALOGIST Vol.: 70 Pages: 773
DOI:10.3749/canmin.50.3.773
Confined Etching within 2D and 3D Colloidal Crystals for Tunable Nanostructured Templates: Local Environment Matters
2017
Fedja J. Wendisch, Richard Oberreiter, Miralem Salihovic, Michael S. Elsaesser, and Gilles R. Bourret
ACS Applied Materials and Interfaces, 2017, 9 (4), pp 3931–3939
https://pubs.acs.org/doi/abs/10.1021/acsami.6b14226
Three-Dimensional Lithography on Si Micro- and Nanowire Arrays
2018
F. J. Wendisch, Michael S. Saller, A. Eadie, A. Reyer, M. Musso, M. Rey, N. Vogel, O. Diwald, and G. Bourret
Nano Letters
https://doi.org/10.1021/acs.nanolett.8b03608
Surface patterning with SiO2@PNiPAm core-shell particles
2018
J. S. J. Tang, R. S. Bader, E. Goerlitzer, F. J. Wendisch, G. R. Bourret, M. Rey, N. Vogel
ACS Omega
https://doi.org/10.1021/acsomega.8b01985
Morphology-Graded Silicon Nanowire Arrays via Chemical Etching: Engineering Optical Properties at the Nanoscale and Macroscale
2020
F. J. Wendisch, M. Abazari, H. Mahdavi, M. Rey, N. Vogel, M. Musso, O. Diwald, and G. R. Bourret
ACS AMI
https://doi.org/10.1021/acsami.9b21466
Spatioselective Deposition of Passivating and Electrocatalytic Layers on Si Nanowire Arrays
2020
F. J. Wendisch, M. Abazari, V. Werner, H. Barb, M. Rey, E.S.A. Goerlitzer, N. Vogel, H. Mahdavi, and G. R. Bourret
ACS AMI
https://doi.org/10.1021/acsami.0c14013
Large-Scale Synthesis of Highly Uniform Silicon Nanowire Arrays Using Metal-Assisted Chemical Etching
2020
F. J. Wendisch, M. Abazari, V. Werner, H. Barb, M. Rey, E.S.A. Goerlitzer, N. Vogel, H. Mahdavi, and G. R. Bourret
ACS AMI
https://doi.org/10.1021/acsami.0c14013
Selective Enhancement of Surface and Bulk E-Field within Porous AuRh and AuRu Nanorods
2021
Piaskowski, Alisher Ibragimov, Fedja J. Wendisch and Gilles R. Bourret
J. Phys. Chem. C
https://doi.org/10.1021/acs.jpcc.1c08699
Anisotropic Silicon Nanowire Arrays Fabricated by Colloidal Lithography
2021
M. Rey, F. Wendisch, E. Goerlitzer, J. Tang, R. Bader, G. R Bourret, N. Vogel
Nanoscale Advances
https://pubs.rsc.org/en/content/articlehtml/2021/na/d1na00259g
Selective Enhancement of Surface and Bulk E-Field within Porous AuRh and AuRu Nanorods
2021
Piaskowski, Alisher Ibragimov, Fedja J. Wendisch and Gilles R. Bourret
J. Phys. Chem. C
https://doi.org/10.1021/acs.jpcc.1c08699
Self-Assembled Au Nanoparticle Monolayers on Silicon in Two- and Three-Dimensions for Surface-Enhanced Raman Scattering Sensing
2022
T. Bartschmid, A. Farhadi, M. Musso, E. S. A. Goerlitzer, N. Vogel, G. R. Bourret
ACS ANM
https://pubs.acs.org/doi/full/10.1021/acsanm.2c01904
Dewetting-Assisted Patterning: A Lithography-Free Route to Synthesize Black and Colored Silicon
2023
Amin Farhadi, Theresa Bartschmid, and Gilles R. Bourret
ACS AMI
https://doi.org/10.1021/acsami.3c08533
Rh in the gap: maximizing E-field enhancement within nanorod heterodimers†
2023
Joshua Piaskowski, Georg Haberfehlner, Theresa Bartschmid, Gerald Kothleitner, Martin Steinhart and Gilles R. Bourret
J. Mater. Chem. C
https://pubs.rsc.org/en/content/articlehtml/2023/tc/d3tc00957b
Conformal Coverage of ZnO Nanowire Arrays by ZnMnO3: Room-temperature Photodeposition from Aqueous Solution
2023
Rettenmaier, K., Zickler, G.A., Berger, T.
ChemPhysChem
https://chemistry-europe.onlinelibrary.wiley.com/doi/10.1002/cphc.202300250
10.1002/cphc.202300250
Substrate-Enabled Room-Temperature Electrochemical Deposition of Crystalline ZnMnO3
2023
Rettenmaier, K., Zickler, G.A., Redhammer, G.J., Berger, T.
ChemPhysChem
https://chemistry-europe.onlinelibrary.wiley.com/doi/10.1002/cphc.202200586
10.1002/cphc.202200586
2012
Topa, D.; Makovicky, E.; Llinca, G.; Dittrich, H.
CANADIAN MINERALOGIST Vol.: 70 Pages: 773
DOI:10.3749/canmin.50.3.773
Confined Etching within 2D and 3D Colloidal Crystals for Tunable Nanostructured Templates: Local Environment Matters
2017
Fedja J. Wendisch, Richard Oberreiter, Miralem Salihovic, Michael S. Elsaesser, and Gilles R. Bourret
ACS Applied Materials and Interfaces, 2017, 9 (4), pp 3931–3939
https://pubs.acs.org/doi/abs/10.1021/acsami.6b14226
Three-Dimensional Lithography on Si Micro- and Nanowire Arrays
2018
F. J. Wendisch, Michael S. Saller, A. Eadie, A. Reyer, M. Musso, M. Rey, N. Vogel, O. Diwald, and G. Bourret
Nano Letters
https://doi.org/10.1021/acs.nanolett.8b03608
Surface patterning with SiO2@PNiPAm core-shell particles
2018
J. S. J. Tang, R. S. Bader, E. Goerlitzer, F. J. Wendisch, G. R. Bourret, M. Rey, N. Vogel
ACS Omega
https://doi.org/10.1021/acsomega.8b01985
Morphology-Graded Silicon Nanowire Arrays via Chemical Etching: Engineering Optical Properties at the Nanoscale and Macroscale
2020
F. J. Wendisch, M. Abazari, H. Mahdavi, M. Rey, N. Vogel, M. Musso, O. Diwald, and G. R. Bourret
ACS AMI
https://doi.org/10.1021/acsami.9b21466
Spatioselective Deposition of Passivating and Electrocatalytic Layers on Si Nanowire Arrays
2020
F. J. Wendisch, M. Abazari, V. Werner, H. Barb, M. Rey, E.S.A. Goerlitzer, N. Vogel, H. Mahdavi, and G. R. Bourret
ACS AMI
https://doi.org/10.1021/acsami.0c14013
Large-Scale Synthesis of Highly Uniform Silicon Nanowire Arrays Using Metal-Assisted Chemical Etching
2020
F. J. Wendisch, M. Abazari, V. Werner, H. Barb, M. Rey, E.S.A. Goerlitzer, N. Vogel, H. Mahdavi, and G. R. Bourret
ACS AMI
https://doi.org/10.1021/acsami.0c14013
Selective Enhancement of Surface and Bulk E-Field within Porous AuRh and AuRu Nanorods
2021
Piaskowski, Alisher Ibragimov, Fedja J. Wendisch and Gilles R. Bourret
J. Phys. Chem. C
https://doi.org/10.1021/acs.jpcc.1c08699
Anisotropic Silicon Nanowire Arrays Fabricated by Colloidal Lithography
2021
M. Rey, F. Wendisch, E. Goerlitzer, J. Tang, R. Bader, G. R Bourret, N. Vogel
Nanoscale Advances
https://pubs.rsc.org/en/content/articlehtml/2021/na/d1na00259g
Selective Enhancement of Surface and Bulk E-Field within Porous AuRh and AuRu Nanorods
2021
Piaskowski, Alisher Ibragimov, Fedja J. Wendisch and Gilles R. Bourret
J. Phys. Chem. C
https://doi.org/10.1021/acs.jpcc.1c08699
Self-Assembled Au Nanoparticle Monolayers on Silicon in Two- and Three-Dimensions for Surface-Enhanced Raman Scattering Sensing
2022
T. Bartschmid, A. Farhadi, M. Musso, E. S. A. Goerlitzer, N. Vogel, G. R. Bourret
ACS ANM
https://pubs.acs.org/doi/full/10.1021/acsanm.2c01904
Dewetting-Assisted Patterning: A Lithography-Free Route to Synthesize Black and Colored Silicon
2023
Amin Farhadi, Theresa Bartschmid, and Gilles R. Bourret
ACS AMI
https://doi.org/10.1021/acsami.3c08533
Rh in the gap: maximizing E-field enhancement within nanorod heterodimers†
2023
Joshua Piaskowski, Georg Haberfehlner, Theresa Bartschmid, Gerald Kothleitner, Martin Steinhart and Gilles R. Bourret
J. Mater. Chem. C
https://pubs.rsc.org/en/content/articlehtml/2023/tc/d3tc00957b
Conformal Coverage of ZnO Nanowire Arrays by ZnMnO3: Room-temperature Photodeposition from Aqueous Solution
2023
Rettenmaier, K., Zickler, G.A., Berger, T.
ChemPhysChem
https://chemistry-europe.onlinelibrary.wiley.com/doi/10.1002/cphc.202300250
10.1002/cphc.202300250
Substrate-Enabled Room-Temperature Electrochemical Deposition of Crystalline ZnMnO3
2023
Rettenmaier, K., Zickler, G.A., Redhammer, G.J., Berger, T.
ChemPhysChem
https://chemistry-europe.onlinelibrary.wiley.com/doi/10.1002/cphc.202200586
10.1002/cphc.202200586