Klosterneuburg | Website
The MEB 550S electron beam evaporator with fully automated control. For reduced pumping time the machine has a load lock and is capable of processing substrates up to 4". The substrate holder can be adjusted in an angel to the source with an accuracy of 0.01°. It also can rotate around it's own axis. For cleaning/etching substrates the evaporator has an ion gun with which an O2 or Ar/O2 plasma can be created. The accuracy of the deposition rate is determined by an oscillating crystal and is up to 0.01nm/s.
Available Metals: Al, Au, Pd, Pt, Ti, Cr, Co, V, Nb
Dr. Salvatore Bagiante
Methods & Expertise for Research Infrastructure
Micro- and nanofabrication processing, development of new processes, characterization, training