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The PFIB dual beam system, installed at IST Austria, combines a FIB column with an Ultra high resolution – SEM (UHR-SEM). This system represents the state of the art in focused ion beam technology. A typical gallium FIB has a maximum current of 100 nA, whereas the xenon-based Helios G4 PFIB has a maximum current of 2.5 μA. As the cutting rate is proportional to the current, the Helios G4 allows to increase the cutting speed by a factor of 25 while maintaining a 15 nm resolution even at the highest cutting rate. While the UHR-SEM column allow us to reach a resolution of 0.7nm @1kV.
The system is also equipped with state-of-the-art detectors for Energy Dispersing Detectors (EDS), Electron Backscatter Diffraction (EBSD), Scanning Transmission Electron Microscopy (STEM) analysis, and a MultiChem injection system to deliver up to six gases in the chamber.
Dr. Salvatore Bagiante
Samples preparation, introdutions
Methods & Expertise for Research Infrastructure
Micro- and nanofabrication processing, development of new processes, characterization, training