SPUTTER SYSTEM CLUSTEX 100 M

University of Salzburg

Salzburg | Website

Open for Collaboration

Short Description

The cluster sputtering system is used for the deposition of functional thin films under high-purity conditions. The apparatus consists of a preparation chamber, a chamber for the deposition of metal layers or transparent conductive oxide layers, a chamber for the deposition of sulfide layers and a process control unit.

Contact Person

Prof. Dr. Oliver Diwald

Research Services

Production of thin layers by means of sputtering processes

Methods & Expertise for Research Infrastructure

The cluster sputtering system produces pure and composite nanostructures of metals and semiconductor materials. These structures are developed in the form of thin films for photocatalytic and photovoltaic applications. A further focus is the design and production of light-absorbing materials prepared using this method.

Allocation to research infrastructure

Functional materials

Terms of Use

Please contact the University of Salzburg (science_plus@plus.ac.at) or the responsible contact person for this section mentioned in the contact field.

Cooperation Partners

Department of Geography and Geology, University of Salzburg
Chemmetall

Reference Projects

Sulfosalze in der Energiewandlung
2007-2016
Dittrich, H.
Christian-Doppler Gesellschaft

Nature, reactivity and functionality of hydrogen-derived electron centers in semiconducting oxides
2015 - 2019
Thomas Berger
FWF
https://www.uni-salzburg.at/index.php?id=204780&L=1

Field-Enhanced Photocatalysis at Nanoscale Gaps
2020-2024
Bourret, G.
FWF
https://sites.google.com/view/gillesbourret-nanomaterials/research

Optimizing Catalyst Loading Within Nanostructured Silicon Photoelectrodes
2020-2023
Bourret, G.; Farhadi, A.
ÖAW

Charge separation within graded metal oxide nanocomposites
2023-2026
Diwald, O.; Bourret, G.
FWF

ERC Starting Grant SOLIDCON
2023 - 2028
Christian Prehal
European Research Council

Reference Publications

Cupromakopavonite, Cu8Ag3Pb4Bi19S38, A new mineral species, ist crystal structure and the cupropavonite homologous series
2012
Topa, D.; Makovicky, E.; Llinca, G.; Dittrich, H.
CANADIAN MINERALOGIST Vol.: 70 Pages: 773
DOI:10.3749/canmin.50.3.773

Confined Etching within 2D and 3D Colloidal Crystals for Tunable Nanostructured Templates: Local Environment Matters
2017
Fedja J. Wendisch, Richard Oberreiter, Miralem Salihovic, Michael S. Elsaesser, and Gilles R. Bourret
ACS Applied Materials and Interfaces, 2017, 9 (4), pp 3931–3939
https://pubs.acs.org/doi/abs/10.1021/acsami.6b14226

Three-Dimensional Lithography on Si Micro- and Nanowire Arrays
2018
F. J. Wendisch, Michael S. Saller, A. Eadie, A. Reyer, M. Musso, M. Rey, N. Vogel, O. Diwald, and G. Bourret
Nano Letters
https://doi.org/10.1021/acs.nanolett.8b03608

Surface patterning with SiO2@PNiPAm core-shell particles
2018
J. S. J. Tang, R. S. Bader, E. Goerlitzer, F. J. Wendisch, G. R. Bourret, M. Rey, N. Vogel
ACS Omega
https://doi.org/10.1021/acsomega.8b01985

Morphology-Graded Silicon Nanowire Arrays via Chemical Etching: Engineering Optical Properties at the Nanoscale and Macroscale
2020
F. J. Wendisch, M. Abazari, H. Mahdavi, M. Rey, N. Vogel, M. Musso, O. Diwald, and G. R. Bourret
ACS AMI
https://doi.org/10.1021/acsami.9b21466

Spatioselective Deposition of Passivating and Electrocatalytic Layers on Si Nanowire Arrays
2020
F. J. Wendisch, M. Abazari, V. Werner, H. Barb, M. Rey, E.S.A. Goerlitzer, N. Vogel, H. Mahdavi, and G. R. Bourret
ACS AMI
https://doi.org/10.1021/acsami.0c14013

Large-Scale Synthesis of Highly Uniform Silicon Nanowire Arrays Using Metal-Assisted Chemical Etching
2020
F. J. Wendisch, M. Abazari, V. Werner, H. Barb, M. Rey, E.S.A. Goerlitzer, N. Vogel, H. Mahdavi, and G. R. Bourret
ACS AMI
https://doi.org/10.1021/acsami.0c14013

Selective Enhancement of Surface and Bulk E-Field within Porous AuRh and AuRu Nanorods
2021
Piaskowski, Alisher Ibragimov, Fedja J. Wendisch and Gilles R. Bourret
J. Phys. Chem. C
https://doi.org/10.1021/acs.jpcc.1c08699

Anisotropic Silicon Nanowire Arrays Fabricated by Colloidal Lithography
2021
M. Rey, F. Wendisch, E. Goerlitzer, J. Tang, R. Bader, G. R Bourret, N. Vogel
Nanoscale Advances
https://pubs.rsc.org/en/content/articlehtml/2021/na/d1na00259g

Selective Enhancement of Surface and Bulk E-Field within Porous AuRh and AuRu Nanorods
2021
Piaskowski, Alisher Ibragimov, Fedja J. Wendisch and Gilles R. Bourret
J. Phys. Chem. C
https://doi.org/10.1021/acs.jpcc.1c08699

Self-Assembled Au Nanoparticle Monolayers on Silicon in Two- and Three-Dimensions for Surface-Enhanced Raman Scattering Sensing
2022
T. Bartschmid, A. Farhadi, M. Musso, E. S. A. Goerlitzer, N. Vogel, G. R. Bourret
ACS ANM
https://pubs.acs.org/doi/full/10.1021/acsanm.2c01904

Dewetting-Assisted Patterning: A Lithography-Free Route to Synthesize Black and Colored Silicon
2023
Amin Farhadi, Theresa Bartschmid, and Gilles R. Bourret
ACS AMI
https://doi.org/10.1021/acsami.3c08533

Rh in the gap: maximizing E-field enhancement within nanorod heterodimers†
2023
Joshua Piaskowski, Georg Haberfehlner, Theresa Bartschmid, Gerald Kothleitner, Martin Steinhart and Gilles R. Bourret
J. Mater. Chem. C
https://pubs.rsc.org/en/content/articlehtml/2023/tc/d3tc00957b

Conformal Coverage of ZnO Nanowire Arrays by ZnMnO3: Room-temperature Photodeposition from Aqueous Solution
2023
Rettenmaier, K., Zickler, G.A., Berger, T.
ChemPhysChem
https://chemistry-europe.onlinelibrary.wiley.com/doi/10.1002/cphc.202300250
10.1002/cphc.202300250

Substrate-Enabled Room-Temperature Electrochemical Deposition of Crystalline ZnMnO3
2023
Rettenmaier, K., Zickler, G.A., Redhammer, G.J., Berger, T.
ChemPhysChem
https://chemistry-europe.onlinelibrary.wiley.com/doi/10.1002/cphc.202200586
10.1002/cphc.202200586