SPUTTER SYSTEM CLUSTEX 100 M

University of Salzburg

Salzburg | Website

Short Description

The cluster sputtering system is used for the deposition of functional thin films under high-purity conditions. The apparatus consists of a preparation chamber, a chamber for the deposition of metal layers or transparent conductive oxide layers, a chamber for the deposition of sulfide layers and a process control unit.

Contact Person

Prof. Dr. Oliver Diwald

Research Services

Production of thin layers by means of sputtering processes

Methods & Expertise for Research Infrastructure

The cluster sputtering system produces pure and composite nanostructures of metals and semiconductor materials. These structures are developed in the form of thin films for photocatalytic and photovoltaic applications. A further focus is the design and production of light-absorbing materials prepared using this method.

Allocation to Core Facility

Functional materials