Short Description
The MEB 550S electron beam evaporator with fully automated control. For reduced pumping time the machine has a load lock and is capable of processing substrates up to 4". The substrate holder can be adjusted in an angel to the source with an accuracy of 0.01°. It also can rotate around it's own axis. For cleaning/etching substrates the evaporator has an ion gun with which an O2 or Ar/O2 plasma can be created. The accuracy of the deposition rate is determined by an oscillating crystal and is up to 0.01nm/s.
Available Metals: Al, Au, Pd, Pt, Ti, Cr, Co, V, Nb
Contact Person
Dr. Salvatore Bagiante
Research Services
Metals and insulators deposition and sample preparation.
Methods & Expertise for Research Infrastructure
Micro- and nanofabrication processing, development of new processes, characterization, training
Allocation to research infrastructure
Information on terms of use, cooperation and fees is provided upon request. All such information is defined in a scientific collaboration agreement.