Atomic Layer Deposition System Savannah 100

JKU - Johannes Kepler University Linz

Linz | Website

Large equipment

Short Description

System for deposition of thin dielectric layers (Alumina, Hafnia, Titania) on substrates with up to 100 mm diameter

Contact Person

Univ.-Prof. Dr. Armando Rastelli

Research Services

- Thin film coating with Alumina, Hafnia or Titania
- Measurement of thermal conductivity of thin films

Methods & Expertise for Research Infrastructure

The system is mostly used for the deposition of thin electrically insulating layers for thermal conductivity measurements with the "3-Omega Method" as well for gate oxides in transistors and photonic structures. The method is particularly suited for conformal coating of three-dimensional structures.

Allocation to Core Facility

Zentrum für Halbleiter Nanostrukturen

Upon appointment, for information, JKU website http://www.jku.at/hfp/.
CEA Grenoble, FR
IFW Dresden, DE
Univ. Illinois, USA
Role of Surface-Segregation-Driven Intermixing on the Thermal Transport through Planar Si/Ge Superlattices, 2013, Peixuan Chen, N. A. Katcho, J. P. Feser, Wu Li, M. Glaser, O. G. Schmidt, David G. Cahill, N. Mingo, and A. Rastelli, Phys. Rev. Lett. 111, 115901, http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.111.115901