JKU - Johannes Kepler University Linz
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Short Description
Oxford Plasmalab 100 with cryo stage
Reactive ion etching facility with inductively coupled plasma and provisions for sample cooling down to the temperature of liquid nitrogen. Purpose: anisotropic dry etching of silicon-based heterostructures on the nanoscale.
Contact Person
Univ.-Prof. Dr. Armando Rastelli
Research Services
Oxford Plasmalab 100 with cryo stage
Reactive ion etching facility with inductively coupled plasma and provisions for sample cooling down to the temperature of liquid nitrogen. Purpose: anisotropic dry etching of silicon-based heterostructures on the nanoscale.
Methods & Expertise for Research Infrastructure
The fabrication of nanoelectronic and nanooptical devices based on silicon-germanium heterostructures requires anisotropic dry etching. The Oxford Plasmalab 100 is a particularly versatile tool for this purpose, which uses an inductively coupled plasma and a cryostage for the substrate. As a result, nanostructures with perpendiculare sidewalls can be implemented.
R. Jannesari, M. Schatzl, F. Hackl, M. Glaser, K. Hingerl, T. Fromherz and F. Schäffler,
Opt. Express 22, 25426-25435 (2014),
http://dx.doi.org/10.1364/OE.22.025426
Single SiGe quantum dots deterministically aligned to the antinodes of a photonic crystal cavity mode,
M. Schatzl, F. Hackl, T. Fromherz, F. Schäffler,
IEEE Proc. 12th Int. Conf. Group IV Photonics (GFP), pp. 39-40 (2015)
http://dx.doi.org/10.1109/Group4.2015.7305943