Atomic Layer Deposition System Savannah 100

JKU - Johannes Kepler University Linz

Linz | Website

Large equipment

Short Description

System for deposition of thin dielectric layers (Alumina, Hafnia, Titania) on substrates with up to 100 mm diameter

Contact Person

Univ.-Prof. Dr. Armando Rastelli

Research Services

- Thin film coating with Alumina, Hafnia or Titania
- Measurement of thermal conductivity of thin films

Methods & Expertise for Research Infrastructure

The system is mostly used for the deposition of thin electrically insulating layers for thermal conductivity measurements with the "3-Omega Method" as well for gate oxides in transistors and photonic structures. The method is particularly suited for conformal coating of three-dimensional structures.

Allocation to Core Facility

Zentrum für Halbleiter Nanostrukturen

Univ.-Prof. Dr. Armando Rastelli
Institut für Halbleiter- und Festkörperphysik, Abteilung für Halbleiterphysik
+43 732 2468 9601
Upon appointment, for information, JKU website
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Role of Surface-Segregation-Driven Intermixing on the Thermal Transport through Planar Si/Ge Superlattices, 2013, Peixuan Chen, N. A. Katcho, J. P. Feser, Wu Li, M. Glaser, O. G. Schmidt, David G. Cahill, N. Mingo, and A. Rastelli, Phys. Rev. Lett. 111, 115901,