Electron-beam lithography system: Raith eLine plus

JKU - Johannes Kepler University Linz

Linz | Website

Large equipment

Short Description

System for the fabrication of nanostructures by means of electron-beam lithography

Contact Person

Univ.-Prof. Dr. Armando Rastelli

Research Services

Electron-beam lithography (30 kV acceleration voltage) on substrates up to 4 inch diameter; laser stage with 10nm accuracy

Methods & Expertise for Research Infrastructure

Electron-beam-lithography, Nanostructuring

Allocation to Core Facility

Zentrum für Halbleiter Nanostrukturen

Univ.-Prof. Dr. Armando Rastelli
Institut für Halbleiter- und Festkörperphysik, Abteilung für Halbleiterphysik
+43 732 2468 9601
Please contact us
Heavy-Hole States in Germanium Hut Wires
Hannes Watzinger, Christoph Kloeffel, Lada Vukušić, Marta D. Rossell, Violetta Sessi, Josip Kukučka, Raimund Kirchschlager, Elisabeth Lausecker, Alisha Truhlar, Martin Glaser, Armando Rastelli, Andreas Fuhrer, Daniel Loss, and Georgios Katsaros
Nano Lett., 2016, 16 (11), pp 6879–6885

Enhanced telecom emission from single group-IV quantum dots by precise CMOS-compatible positioning in photonic crystal cavities
Magdalena Schatzl, Florian Hackl, Martin Glaser, Patrick Rauter, Moritz Brehm, Lukas Spindlberger, Angelica Simbula, Matteo Galli, Thomas Fromherz, and Friedrich Schäffler
ACS Photonics 2017