Oxford Plasmalab 100

JKU - Johannes Kepler University Linz

Linz | Website

Large equipment

Short Description

Oxford Plasmalab 100 with cryo stage
Reactive ion etching facility with inductively coupled plasma and provisions for sample cooling down to the temperature of liquid nitrogen. Purpose: anisotropic dry etching of silicon-based heterostructures on the nanoscale.

Contact Person

Univ.-Prof. Dr. Armando Rastelli

Research Services

Oxford Plasmalab 100 with cryo stage
Reactive ion etching facility with inductively coupled plasma and provisions for sample cooling down to the temperature of liquid nitrogen. Purpose: anisotropic dry etching of silicon-based heterostructures on the nanoscale.

Methods & Expertise for Research Infrastructure

The fabrication of nanoelectronic and nanooptical devices based on silicon-germanium heterostructures requires anisotropic dry etching. The Oxford Plasmalab 100 is a particularly versatile tool for this purpose, which uses an inductively coupled plasma and a cryostage for the substrate. As a result, nanostructures with perpendiculare sidewalls can be implemented.

Univ.-Prof. Dr. Armando Rastelli
Institut für Halbleiter- und Festkörperphysik, Abteilung für Halbleiterphysik
+43 732 2468 960
armando.rastelli@jku.at
http://www.jku.at/hfp/
For details please contact the responsible scientist.
Technical University Vienna, Univ. Pavia
SFB 025 "IRoN" funded by the Fonds zur Förderung der wissenschaftlichen Forschung (FWF) in Austria
Commensurate germanium light emitters in silicon-on-insulator photonic crystal slabs,
R. Jannesari, M. Schatzl, F. Hackl, M. Glaser, K. Hingerl, T. Fromherz and F. Schäffler,
Opt. Express 22, 25426-25435 (2014),
http://dx.doi.org/10.1364/OE.22.025426

Single SiGe quantum dots deterministically aligned to the antinodes of a photonic crystal cavity mode,
M. Schatzl, F. Hackl, T. Fromherz, F. Schäffler,
IEEE Proc. 12th Int. Conf. Group IV Photonics (GFP), pp. 39-40 (2015)
http://dx.doi.org/10.1109/Group4.2015.7305943