Silicon Austria Labs GmbH (SAL)
Villach | Website
This Laser lithography system is a highly versatile, high-resolution pattern generator for direct writing and low-volume mask making.
• 200 mm down 1 cm2 substrate size
• i-line band (375 nm) for negative and positive resist exposures
• grayscale mode for 2.5D pattering
• minimum feature size 1 um
Methods & Expertise for Research Infrastructure
The Heidelberg DWL 66 is used for R&D) in microelectronics, MEMS, microfluidics, sensors, non-standard substrates and advanced packaging and any academic application that requires microstructure fabrication.
Allocation to Core Facility