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System for deposition of thin dielectric layers (Alumina, Hafnia, Titania) on substrates with up to 100 mm diameter
Univ.-Prof. Dr. Armando Rastelli
- Thin film coating with Alumina, Hafnia or Titania
- Measurement of thermal conductivity of thin films
Methods & Expertise for Research Infrastructure
The system is mostly used for the deposition of thin electrically insulating layers for thermal conductivity measurements with the "3-Omega Method" as well for gate oxides in transistors and photonic structures. The method is particularly suited for conformal coating of three-dimensional structures.
Allocation to Core Facility