Short Description
Multiple purpose versatile etching tool for WBG materials and metal etching.
Contact Person
Heimo Müller
Research Services
Research Services
R&D versatile capability etching Tool with wide temperature range heated lower electrode. Proposed for wide band gap materials, glass and ceramics Dry etching. Mechanical clamping for wafers up to 8“ in diameter.
Methods & Expertise for Research Infrastructure
Material etching portfolio:
• Metals
• PZT
• AlN and AlScN (up to 40% Scandium)
• LiNbO
• SiC, SiOC
• GaN, InGaN, AlGaN
Allocation to research infrastructure
The terms of use are to be agreed individually. Send your request to the indicated contact. The GTC of SAL apply: https://silicon-austria-labs.com/agb/